Platform for Measuring the Reflectivity of EUV Multiplayer Films 一种用于极紫外多层膜反射率测量的平台
EUV masks are automatically transferred into and out of the dual pod; the inner pod can be stored inside the InSync environment. EUV掩膜板被自动送入和送出双盒容器(Dualpod)中;其中内层盒可以储存在InSync系统的环境下。
EUV emission of the solar flare 太阳耀斑极紫外辐射
Manufacture and measurement of SiC/ Mg EUV multilayer mirrors in different base pressures 不同本底真空度下SiC/Mg极紫外多层膜的制备和测试
Effect of proton irradiation on transmittance of Al filter at EUV waveband 质子辐照对极紫外波段滤光片透过率的影响
Measure and Analysis of Discharge Produced Plasma EUV Spectrum 放电等离子体极紫外光谱测量及分析
But EUV has been delayed and R& D costs have exploded, causing tool costs to soar out of control. 不过,EUV光刻系统的推广普及日程多次延后,与此相对的是,系统的开发研制费用则成指数级增长,由此导致设备的制造成本已经完全失控。
All materials have strong absorption in EUV region. Therefore, using multilayer coatings is the only approach to construct normal incidence optical systems. 在极紫外波段,任何材料都存在严重的吸收,因此采用多层膜实现高反射率,是构建正入射式光学系统的唯一途径。
The development of novel coatings with improved EUV performance is presented. 本单位致力于开发在此波段具有更好性能的新型薄膜。
Reflective optical elements based on multilayer coatings are have entered the practical stage that take EUV lithography and EUV astrophysics as the core. 目前,基于极紫外多层膜的反射式光学元件,已经全面进入了以极紫外光刻与极紫外天文观测为核心的实用化阶段。
This is the first successful trial of the EUV magneto optical effects in laboratories. 这是EUV波段首次利用激光等离子体光源成功进行的磁光效应测量实验。
In this thesis we designed a EUV multi spectrum space solar telescope ( EUT) based on the requirement of high angular resolution and wide field of view for solar observations; 本文根据空间平台上高分辨率对日观测的需要,设计出一种可以在四个极紫外波段对日同时成像多光谱太阳望远镜(EUT);
Ultra-precision Machining and It's Application for X-Ray/ EUV Optics X射线&极紫外光学中的超精密加工及其应用
A new design of complex space soft X-ray and EUV telescope for space observation is reported. 根据空间对日观测的需要,提出了一种复合型宽波段范围的软X射线&极紫外望远镜的设计方案。
Some progress on top-down nano-fabrication, such as electron beam lithography, X-ray lithography and EUV lithography were introduced. 介绍了电子束曝光技术、EUV光刻技术和X射线光刻技术的进展;
In our model, we have used the latest EUV data on the chromosphere-corona transition region; 在本文的模型中,采用了最新的色球-日冕过渡区的远紫外(EUV)资料;
An optoelectronic imaging system was designed to image EUV light at 17.1 nm. 设计了17.1nm波段光电成像系统,用于对波长为17.1nm的极紫外光进行成像。
Effects of solar activity on EUV absorption processes in the upper atmosphere 太阳活动对EUV辐射在大气中吸收过程的影响
The technology on the processing and detection of the extreme-ultraviolet radiation and X-ray ( EUV/ X-ray) optical component is one of the main categories in modern short-wave band optical research. 极紫外与X射线(EUV/X-ray)光学元件的加工与检测技术的研究是近代短波段光学研究的主要范畴之一。
Development of Laser Produced Plasma Source for EUV Lithography EUV光刻中激光等离子体光源的发展
VUV/ EUV Primary Standard Detector Facility and Transfer Detector Calibration VUV/EUV标准探测器装置和传输标准探测器的标定
Generally, EUV and soft X-ray photodetector included five types: ionization gas, semiconductor, electron multiplier and film. 总的说来极紫外和软X射线光电探测器的类型有气体电离型、半导体型、电子倍增器以及极紫外和软X射线胶片(干板)。
These productions set a solid base on thorough research of capillary discharge EUV source in the future. 这些成果为今后毛细管放电极紫外光源的深入研究奠定了坚实的基础。
Wafer stage is a key subsystem in the extreme ultra violet lithography ( EUV). 工件台系统是极紫外光刻(EUV)的一个关键子系统。
X-ray diffraction optical elements have a broad application in the field of the inertial confinement fusion, astronomical telescopes, synchrotron radiation and EUV lithography. X射线衍射光学元器件在激光惯性约束聚变,天文望远镜,同步辐射,EUV光刻等领域有着广泛应用。
The primary design results achieve the anticipative target, meanwhile the apparatus experience is accumulated for the coming DPP EUV experiment in the process of this design. 本文设计研究了DPPEUV光源装置中的高功率脉冲电源,初步的设计结果达到了预期的指标。同时,设计过程为即将开始的DPPEUV实验积累了经验。
It is the capillary discharge EUV source that exhibits higher output power and conversion efficiency of energy. 毛细管放电极紫外光源具有较高的输出功率及能量转换效率,是极紫外光刻的首选曝光光源之一。