PCVD
英
美
网络 等离子体化学气相沉积法; 等离子体化学汽相沉积法; 猪圆环病毒病; 化学气相沉积; 等离子体化学气相沉积
双语例句
- The Research on the Friction and Wear Properties of Al_2O_3 and DLC PCVD Coating
PCVDAl2O3和类金刚石涂层摩擦磨损性能研究 - Carbon Nanotube Deposited Technology Study of DC Hot-cathode PCVD Method
直流热阴极PCVD方法制备碳纳米管的工艺研究 - The Effect of Fluorine to Loss of Optical Fibers in PCVD Process
在PCVD工艺中氟对光纤损耗的影响 - Study of Diamond Film Deposition with DC Hot cathode PCVD Method
直流热阴级PCVD法制备金刚石膜的研究 - Preparation of Diamond Film by MW-PCVD Method, and Its IR Transmittance and Stress Properties
微波PCVD方法制备金刚石膜及其红外透过率和应力研究 - The service lives of shear dies and punches treated by PVD, CVD and PCVD are compared.
对采用PVD、CVD和PCVD表面涂覆处理的六角切边模和内六角冲头的生产使用情况和使用寿命进行了比较，其中PCVD涂层模具寿命比未涂层模具提高一倍以上。 - PCVD Process for Producing High Silicon Steel and Its Electromagnetic Properties
高硅钢的PCVD制造工艺及其电磁性能 - Material Composition and Structure Design in PCVD Single Mode Optical Fiber
PCVD单模光纤中的材料组成和结构设计 - Properties and Structure of PCVD Ti ( CNO) Films
PCVD-Ti（CNO）薄膜的性能及结构分析 - The plasma development, anodization, polymerization and PCVD are discussed briefly.
本文还对等离子体显影、阳极化、聚合及PCVD等作了简要讨论。 - Residual stresses, deformation resistance and wear resistance of PCVD TiN coating are determined.
测定并分析了用PCVD法获得的TiN涂层内的残余应力、涂层的抗变形性以及涂层的耐磨性。 - In this paper, on the basis of the summarization of nano film materials 'preparation, the potential technology-plasma chemical vapor deposition ( PCVD) are proposed.
本文围绕硅系纳米复合薄膜的材料特点，说明了等离子体化学气相沉积（PCVD）技术的工作原理和装置结构，以及该技术在硅系纳米复合薄膜制备中的独特优点。 - Abstract DC-PCVD for TiN coating processes was discussed with temperature control. Coating colour control and other problems. Some measures of preventing substrate from overheating and of ensuring coating colour were put forward.
本文讨论了直流PCVD法沉积TiN工艺中温度控制、色泽控制等问题，提出了预防工件过热、确保涂层色泽的工艺措施，还提出了涂层黑斑的成因及消除方法。 - Design and manufacture the large effective area non zero dispersion shifted fiber ( LAPOSH Fiber) using PCVD technology.
设计并采用PCVD工艺制造了大有效面积非零色散位移光纤（LAPOSH光纤）。 - The PCVD process was introduced simply in this paper, the main factors to influence the parameters of fiber in PCVD process were discussed also.
本文简单地介绍了PCVD工艺的特点，分析了PCVD工艺中影响光纤参数的主要因素； - Influences of deposition pressure on mw& pcvd diamond film
沉积气压对MW-PCVD制备金刚石薄膜的影响 - The author briefly summarizes the principles, properties and equipment of PCVD technique.
本文简述了PCVD技术的原理、特性、设备。 - The Influence of Substrate Temperature on the Si Deposition Films during the Process of PCVD
在PCVD过程中衬度温度对Si沉积膜的影响 - The Effect of Deposition Voltage on Auxiliary Heat PCVD-TiN Coatings
沉积电压对辅助加热PCVD-TiN涂层的影响 - Influence of Discharge Current on DC Hot Cathode Glow Discharge PCVD and Diamond Films Synthesized by This Method
放电电流对直流热阴极辉光放电等离子体化学气相沉积法及其所制备金刚石膜的影响 - Polysilicon thin films have been obtained by hydrogen plasma heating of a-Si: H films deposited by PCVD. The films were characterized and analyzed by Raman and FT-IR spectra.
采用氢等离子体加热的方法晶化a-Si：H薄膜制备多晶硅薄膜，用Raman散射谱和傅里叶变换红外吸收谱（FT-IR）等方法进行表征和分析。 - Study on the Homogeneity of PCVD Single Mode Optical Fibers
PCVD单模光纤的均匀性研究 - Research of PCVD Method for High Silicon Steel
PCVD法制高硅钢的研究 - The diamond films were deposited in a quartz bell jar type microwave plasma chemical vapour deposition ( MW& PCVD) research device.
利用石英钟罩式微波等离子体化学气相沉积（MW－PCVD）实验装置研究了不同沉积气压对金刚石薄膜沉积结果的影响。 - Nanocomposite Ti-Si-N films and effect of Si contents on pulsed DC PCVD coatings quality
Ti-Si-N纳米复相薄膜及Si含量对脉冲直流PCVD镀膜质量的影响 - The homogeneity of single mode optical fibers made by the PCVD ( Plasma Chemical Vapor Deposition) process is studied.
研究了用等离子体化学汽相沉积工艺（PCVD）制备单模光纤的均匀性问题。 - The paper also presents the investigation of microhardness, surface and fracture zone feature, crystalline structure and chemical composition of TiN, TiC and Ti ( C_xN_y) super-hard coatings. Finally, the paper gives out application cases of the PCVD technique in the cold extrusion punch.
并对其制备的TiN、TiC、Ti（CxNy）超硬膜进行了显微硬度和化学成份等分析，最后介绍了该项技术在冷挤压冲头上的应用实例。 - The super-hard nanocomposite films of Ti-Si-N were prepared by direct current plasma enhanced chemical vapor deposition ( PCVD) on strain-less steel substrate. Dependence of Si content and annealing at elevated temperatures on the microstructure and hardness of Ti-Si-N coatings were investigated.
用直流等离子体增强化学气相沉积（PCVD）方法在不锈钢基体上制备了Ti-Si-N硬质纳米复合薄膜，研究了Si含量对薄膜硬度的影响及高温退火对薄膜晶粒尺寸及其硬度的影响。 - Study on porosity of DC-PCVD TiN Films
直流PCVDTiN膜针孔率的研究 - Prospects for the application of PCVD to locomotive& rolling stock industry;
展望了PCVD工艺在机车车辆上的应用；